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A workshop of the « XXII^èmes Entretiens Jacques Cartier »

Connecting to the nanoworld

Nov. 30 & Dec.1, 2009 Ecole Centrale de Lyon, France

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Ever since Feynman’s famous "There is Plenty of Room at the Bottom" talk in 1959, scientific exploration of the "nanoworld" has led to countless discoveries and the ability to precisely engineer chemical and physical material properties at the nanoscale.

There are two complementary approaches to fabricating structures and devices at the nanoscale, both having their own unique set of challenges:

the bottom-up approach, which can be likened to a mason building a complex structure from elementary units (bricks). The bottom-up approach seeks to tailor the material properties (geometry, optical, mechanical, electrical, chemical, etc.) of relatively simple nano-objects and to assemble these elementary units into an organized structure.

the top-down approach, which can be likened to a sculptor building a structure by removing material from an initial bulk form. The top-down approach seeks to increase the integration and interconnection density of complex nanoscale devices, using for example hybrid integration and 3D architectures.

Both approaches face the difficult technical challenge of interfacing between the nanoworld and our own, macroscopic, world in order to make nanotechnologies useful in everyday life.

In addition, nanotechnologies can only be ultimately relevant if they are embraced by the public as a safe and useful technology. Therefore, this workshop will also address issues related to the use and impacts, both positive and negative, of nanotechnologies.

The objective of this workshop is to bring together recognized experts from various fields related to nanotechnologies (fabrication, characterization, systems engineering, chemistry, biology, social sciences, and others) for broad-based discussions on connecting to the nanoworld.

Exceptionaly in the ‘Entretiens Jacques Cartier’, English will be the official language of the workshop.

Last version 3 september 2009

Photo credits :  Cea Sinaps, Université de Sherbrooke, Ecole Centrale de Lyon, Institut des Nanotechnologies de Lyon